Fabrication Engineering at the Micro- and Nanoscale, 4/e (Paperback)

Stephen A. Campbell

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商品描述

Designed for advanced undergraduate or first-year graduate courses in semiconductor or microelectronic fabrication, Fabrication Engineering at the Micro- and Nanoscale, Fourth Edition, covers the entire basic unit processes used to fabricate integrated circuits and other devices.

With many worked examples and detailed illustrations, this engaging introduction provides the tools needed to understand the frontiers of fabrication processes.

NEW TO THIS EDITION

Coverage of many new topics including:
- the flash and spike annealing processes
- extreme ultraviolet (EUV) lithography
- GaN epitaxial growth and doping
- double exposure routes to sub-35-nm lithography
- architectures for nanoscale CMOS as practiced at the 45-nm node
- trigate or FINFET CMOS planned for 22 nm and below
- bulk silicon and thin film solar cell manufacturing
- GaN LED fabrication
- microfluidics

Updated sections on nonoptical lithography

Expanded content on state-of-the-art CMOS

A Companion Website with PowerPoint slides of figures from the text (www.oup.com/us/campbell)

An Instructor's Solutions Manual, available to registered adopters of the text (978-0-19-986121-7)

商品描述(中文翻譯)

《微納米尺度製程工程》第四版,適用於高年級本科生或研究生的半導體或微電子製程課程。本書涵蓋了製造集成電路和其他器件所使用的所有基本單元製程。

本書以許多實例和詳細插圖為特色,提供了理解製程前沿所需的工具。

本版新增了許多新主題,包括:
- 快閃和尖峰退火過程
- 極紫外(EUV)光刻
- GaN外延生長和摻雜
- 雙曝光路徑用於次35奈米光刻
- 45奈米節點上實踐的納米尺度CMOS架構
- 計劃用於22奈米及以下的三閘或FINFET CMOS
- 塊狀矽和薄膜太陽能電池製造
- GaN LED製造
- 微流體學

非光學光刻的部分進行了更新。

對於最先進的CMOS技術的內容進行了擴充。

附帶網站提供了從本書中的圖片中提取的PowerPoint幻燈片(www.oup.com/us/campbell)。

教師解答手冊可供註冊採用本書的教師使用(978-0-19-986121-7)。