Nano-CMOS Design for Manufacturability: Robust Circuit and Physical Design for Sub-65nm Technology Nodes (Hardcover)
暫譯: 納米CMOS可製造性設計:針對65nm以下技術節點的穩健電路與物理設計(精裝版)

Ban P. Wong, Anurag Mittal, Greg W. Starr, Franz Zach, Victor Moroz, Andrew Kahng

  • 出版商: Wiley
  • 出版日期: 2008-11-01
  • 售價: $1,350
  • 貴賓價: 9.8$1,323
  • 語言: 英文
  • 頁數: 408
  • 裝訂: Hardcover
  • ISBN: 0470112808
  • ISBN-13: 9780470112809
  • 相關分類: CMOS
  • 下單後立即進貨 (約5~7天)

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商品描述

Discover innovative tools that pave the way from circuit and physical design to fabrication processing

Nano-CMOS Design for Manufacturability examines the challenges that design engineers face in the nano-scaled era, such as exacerbated effects and the proven design for manufacturability (DFM) methodology in the midst of increasing variability and design process interactions. In addition to discussing the difficulties brought on by the continued dimensional scaling in conformance with Moore's law, the authors also tackle complex issues in the design process to overcome the difficulties, including the use of a functional first silicon to support a predictable product ramp. Moreover, they introduce several emerging concepts, including stress proximity effects, contour-based extraction, and design process interactions.

This book is the sequel to Nano-CMOS Circuit and Physical Design, taking design to technology nodes beyond 65nm geometries. It is divided into three parts:

  • Part One, Newly Exacerbated Effects, introduces the newly exacerbated effects that require designers' attention, beginning with a discussion of the lithography aspects of DFM, followed by the impact of layout on transistor performance

  • Part Two, Design Solutions, examines how to mitigate the impact of process effects, discussing the methodology needed to make sub-wavelength patterning technology work in manufacturing, as well as design solutions to deal with signal, power integrity, WELL, stress proximity effects, and process variability

  • Part Three, The Road to DFM, describes new tools needed to support DFM efforts, including an auto-correction tool capable of fixing the layout of cells with multiple optimization goals, followed by a look ahead into the future of DFM

Throughout the book, real-world examples simplify complex concepts, helping readers see how they can successfully handle projects on Nano-CMOS nodes. It provides a bridge that allows engineers to go from physical and circuit design to fabrication processing and, in short, make designs that are not only functional, but that also meet power and performance goals within the design schedule.

商品描述(中文翻譯)

發現創新的工具,為從電路和物理設計到製造處理鋪平道路

《Nano-CMOS 可製造性設計》探討了設計工程師在奈米尺度時代面臨的挑戰,例如加劇的效應以及在變異性和設計過程互動增加的情況下,已證實的可製造性設計(DFM)方法論。除了討論隨著摩爾定律持續縮小尺寸所帶來的困難外,作者還針對設計過程中的複雜問題進行探討,以克服這些困難,包括使用功能優先的矽片來支持可預測的產品增長。此外,他們還介紹了幾個新興概念,包括應力接近效應、基於輪廓的提取和設計過程互動。

本書是《Nano-CMOS 電路與物理設計》的續集,將設計推向超過 65nm 幾何的技術節點。全書分為三個部分:

第一部分,新加劇的效應,介紹了需要設計師注意的新加劇效應,首先討論 DFM 的光刻方面,接著探討佈局對晶體管性能的影響。

第二部分,設計解決方案,探討如何減輕製程效應的影響,討論使亞波長圖案技術在製造中運作所需的方法論,以及應對信號、電源完整性、WELL、應力接近效應和製程變異性的設計解決方案。

第三部分,通往 DFM 的道路,描述了支持 DFM 工作所需的新工具,包括能夠修正具有多個優化目標的單元佈局的自動修正工具,並展望 DFM 的未來。

在整本書中,真實世界的例子簡化了複雜的概念,幫助讀者了解如何成功處理 Nano-CMOS 節點的專案。它提供了一座橋樑,使工程師能夠從物理和電路設計轉向製造處理,簡而言之,創造出不僅功能性強,還能在設計時間表內滿足功率和性能目標的設計。